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The Gap Between Eye "Mask" Compliance, BER and BER contours.

Martin Miller (Chief Scientist, Teledyne-LeCroy)

Location: Ballroom A

Date: Wednesday, January 31

Time: 10:00am - 10:45am

Pass Type: 2-Day Pass, All Access Pass, Alumni All Access Pass - Get your pass now!

Track: 13. Applying Test and Measurement Methodology

Audience Level: Intermediate

Format: 45-Minute Technical Session

Vault Recording: TBD

Audience Level: Intermediate

A brief historical review of Eye Diagrams and mask testing, followed by a statistical dive into how mask testing results relate to Bit Error Ratio. The BER contour is investigated as a coexisting tool for understanding BER.

Hopefully participants will have a clearer understanding of these Eye Diagram tests and what do they mean, both conceptually and practically.


Learn more about what mask testing and measurements of BER contours tell the system engineer about BER.

Intended Audience

For Eye diagram analysis, how does "mask compliance" testing relate to Bit Error Ratio and BER contours? What quantitative information do these tests/measurements yield? Maybe these things do not mean what you think they mean.

This is an attempt to clarify and reconcile these concepts and methods.