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April 5-7, 2022|Santa Clara Convention Center| Santa Clara, CA
Chaofeng Li received the B.S. degree in electronic science and technology from Guilin University of Electronic Technology, Guilin, China, in 2016, and the M.S. degree in the electromagnetic field and microwave technology from the University of Electronic Science and Technology of China, Chengdu, China, in 2019. He is currently pursuing a Ph.D. degree in electrical engineering from Missouri University of Science and Technology (formerly University of Missouri - Rolla), Rolla, MO, USA. His current research interests include signal Integrity, equivalent modeling for high-speed channels, material characterization method, and chip-PDN impedance modeling.